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UHV Systems

  • Model IMBE300-B, Basic Configuration - Integrated Molecular Beam Epitaxy System: Overview
  • Model IMBE300, Integrated Molecular Beam Epitaxy System: Overview
  • Model LEED-MBE250, Sample Preparation and Deposition UHV System: Overview
  • Model MAS120, Mini-Analytical System: Overview
  • Series LADP800, Large-Area Auger Depth Profiler: Overview
  • Series ADP200 with Sample Load Lock - Industrial LEED and AES Depth Profiler Series: Overview

Model IMBE300-B, Basic Configuration - Integrated Molecular Beam Epitaxy System

UHV System: Integrated Molecular Beam Epitaxy (MBE) System IMBE300-B
Integrated Molecular Beam Epitaxy System IMBE300-B

Excellent MBE system for synthesis of nanoscale materials for semiconductors and energy applications with integrated in-situ characterization tools.

Techniques:

  • LEED ( Low Energy Electron Diffraction)
  • AES ( Auger Electron Spectroscopy)
  • Ion Argon, Oxygen and Hydrogen Bombardment
  • Thin Film Thickness Monitor
  • 7 Deposition Sources

Available Ports:

  • XPS ( X-Ray Photoelectron Spectroscopy)
  • RHEED (Reflection High Energy Electron Diffraction)
  • TDS ( Thermal desorption Spectroscopy)

Features:

  • Short switching time between deposition and surface characterization
  • Easy sample transfer; simple compatibility to microscopy & further processing
  • Optional electrochemical chamber
  • Ease of operation

Download Information Poster/Brochure:

Download the Integrated MBE System IMBE300-B Poster/Brochurepdf download icon


Integrated Molecular Beam Epitaxy System IMBE300

UHV System: Integrated Molecular Beam Epitaxy (MBE) System IMBE300
Integrated Molecular Beam Epitaxy System IMBE300

Epitaxial Growth Process with integrated monitoring, 2-D crystallography, composition and electronics band analysis in one UHV chamber.

Techniques:

  • LEED (Low Energy Electron Diffraction)
  • AES (Auger Electron Spectroscopy)
  • 7 Deposition Sources
  • XPS (X-Ray Photoelectron Spectroscopy)
  • RHEED (Reflection High Energy Electron Diffraction)
  • TDS (Thermal Desorption Mass Spectroscopy)

Features:

  • No need to transfer to another UHV chamber for analysis after film growth
  • Short switching time between deposition and surface science analysis
  • Load-lock with transfer arm and sample storage
  • Sample transfer compatibility with other systems: SPM and SEM

Download Brochure:

Download the IMBE300 System Brochurepdf download icon


Sample Preparation and Deposition UHV System Model LEED-MBE250

UHV System: Sample Preparation and Deposition UHV System
Model LEED-MBE250
Sample Preparation and Deposition UHV System Model LEED-MBE250

Techniques:

  • LEED (Low Energy Electron Diffraction)
  • AES (Auger Electron Spectroscopy)
  • Ion Sputter Sample Cleaning
  • Thermal Sample Annealing
  • TDS (Thermal Desorption Mass Spectroscopy)
  • 7 Deposition Sources

Features:

  • Continuous LEED structure monitoring during film growth from multiple sources
  • Load-lock with transfer arm and sample storage
  • Sample transfer compatibility with other systems: XPS, SPM and SEM

Download Brochure:

Download the LEED-MBE250 Model Brochurepdf download icon


Mini-Analytical System Model MAS120

UHV Spectroscopy System: Mini-Analytical System Model MAS120
UHV Spectroscopy System: Mini-Analytical System Model MAS120

Application Example:

UHV Spectroscopy System: Mini-Analytical System Model MAS120. MAS120 system can be attached to almost any vacuum deposition system via 2 3/4
MAS120 can be attached to almost any vacuum deposition system.

MAS120 system can be attached to almost any vacuum deposition system via 2 3/4" (CF35) port.

Diagnostics and Troubleshooting of The Film Process

  • Purity of Thin Films
  • Atomic Composition
  • 2-D Crystallography
  • Gas Emission and Coating Desorption Characteristics

Techniques:

  • Auger Electron Spectroscopy (AES)
  • Low Energy Electron Diffraction (LEED)
  • Ion Beam Cleaning and Depth Profiling
  • Thermal Desorption Mass Spectroscopy (Optional)

The single crystal reference sample is transferred to the vacuum deposition system, after the process is complete the coated sample is moved back for analysis. MAS120 module operates independently and will not interfere with the existing deposition process.

Download Brochure:

Download the MAS120 Model Brochurepdf download icon


Model LADP800

Series LADP800, Large-Area Auger Depth Profiler
Series LADP800, Large-Area Auger Depth Profiler
Series LADP800, Large-Area Auger Depth Profiler
LADP800 in context

Large Area Auger Depth Profiler

Thin Film Elemental Composition at Different Depth

Model LADP800 is the compact instrument to measure elemental surface composition of thin films using Auger electron spectroscopy and Argon ion bombardment to obtain composition v.s depth. In addition, the instrument can integrate gas emission analysis from thin film.

Features:

  • Customized side UHV attachment to fit most of the vacuum deposition chambers.

Specifications:

For specifications, please visit the product page.

Download Brochure:

Download the LADP800 Series Brochurepdf download icon


Series ADP200 With Sample Load Lock

UHV Spectroscopy System ADP200 Series with Sample Load Lock - Industrial LEED and AES Depth Profiler Series
UHV Spectroscopy System ADP200 Series with Sample Load Lock

Industrial LEED and AES Depth Profiler:

  • Nano-scale measurements of elemental composition on thin films and alloys
  • Analytical system based on LEED and Auger electron spectroscopy and argon ion sputtering for composition and thickness depth profiling of thin films and alloys

Features:

  • Sub-nanometer precision for atomic structures, composition and thickness
  • Analysis of wide range of samples
  • Semi-automatic operation

Specifications:

For specifications, please visit the product page.

Download Brochure:

Download the ADP200 Series Brochurepdf download icon