IONEC - Ion Sputtering Gun
Model IG35-SF-DP with Exchangeable Apertures
The IG35-SF-DP Ion gun is designed for sample surface cleaning and depth profiling with Auger electron spectroscopy. Surface treatments with IG35-SF-DP are applicable to a wide range of materials from metals, semiconductors, and oxides, to thin films and 2D layers.
Features
- Precision sputtering for sample cleaning and depth profiling
- Low operating gas pressure: 10-6 – 10-7 torr
- Compact and simplified design
- Two long life filaments
- Variety of operating gases: Ar, Noble or Reactive
Applications
Surface treatments with IG35-SF-DP are applicable to a wide range of materials from metals, semiconductors, and oxides, to thin films and 2D layers.
Drawings
For seamless integration, 3D step files are available for most models on the PDF Downloads page.
Key Specifications
| IONEC - MODEL IG35-SF-DP | |
|---|---|
| Ion source | Electron impact ionization in magnetic field |
| Ionization Cathode | Tungsten-rhenium filament directly mounted on CF 70mm OD flange |
| Beam current | 0.5 μA at 0.25 keV 2.0 μA at 0.5 keV 3.5 μA at 1.0 keV 4.5 μA at 2.0 keV 7.0 μA at 3.0 keV |
| Operating Ar Pressure | 5.0 x 10-6 torr - Typical |
| Beam Energy | 0 – 3.0 keV |
| Beam size | From 5 to 10mm in diameter |
| Beam uniformity | < 5% |
| Gas input | Direct gas input to ion source via leak valve |
| Mounting | CF1.33“ (DN16CF) flange |
| Bakeability | Under vacuum - 250 °C max |
Configuration & Specifications
The IG35-SF-DP ion gun is controlled using the IPS3-D power supply. For more information, please download the Configuration Guide & Specifications PDF or the brochure below.
Download IG35-SF-DP Configuration Guide & Specifications (.pdf).
Brochure
- IONEC IG35-SF-DP Brochure (.pdf)
