IONEC - Ion Sputtering Gun
Model IG35-DP with Exchangeable Apertures
The IG35-DP Ion gun is designed for sample surface cleaning and depth profiling with Auger electron spectroscopy. Surface treatments with IG35-DP are applicable to a wide range of materials from metals, semiconductors, and oxides, to thin films and 2D layers.
Features
- Precision sputtering for sample cleaning and depth profiling
- Low operating gas pressure: 10-6 – 10-7 torr
- Compact and simplified design
- Two long life filaments
- Variety of operating gases: Ar, Noble or Reactive
Applications
Surface treatments with IG35-DP are applicable to a wide range of materials from metals, semiconductors, and oxides, to thin films and 2D layers.
Drawings
For seamless integration, 3D step files are available for all models.
Key Specifications
| IONEC - MODEL IG35-DP | |
|---|---|
| Ion source | Electron impact ionization in magnetic field |
| Ionization Cathode | Tungsten-rhenium filament directly mounted on CF 70mm OD flange |
| Beam current | 0.5 μA at 0.25 keV 2.0 μA at 0.5 keV 3.5 μA at 1.0 keV 4.5 μA at 2.0 keV 7.0 μA at 3.0 keV |
| Operating Ar Pressure | 5.0 x 10-6 torr - Typical |
| Beam Energy | 0 – 3.0 keV |
| Beam size | From 5 to 10mm in diameter |
| Beam uniformity | < 5% |
| Gas input | Direct gas input to ion source via leak valve |
| Mounting | CF1.33“ (DN16CF) flange |
| Bakeability | Under vacuum - 250 °C max |
Configuration Guide
The IG35 ion gun is controlled using the IPS3-D power supply.
Download IG35 Configuration Guide & Specifications (PDF).
For specifications, ordering, and more information, please download the brochure; see below.
Brochure
- IONEC IG35-DP Brochure (PDF)
