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IONEC - Ion Sputtering Gun

Model IG35-DP with Exchangeable Apertures

The IG35-DP Ion gun is designed for sample surface cleaning and depth profiling with Auger electron spectroscopy. Surface treatments with IG35-DP are applicable to a wide range of materials from metals, semiconductors, and oxides, to thin films and 2D layers.


Features

  • Precision sputtering for sample cleaning and depth profiling
  • Low operating gas pressure: 10-6 – 10-7 torr
  • Compact and simplified design
  • Two long life filaments
  • Variety of operating gases: Ar, Noble or Reactive

Applications

Surface treatments with IG35-DP are applicable to a wide range of materials from metals, semiconductors, and oxides, to thin films and 2D layers.

Drawings

Schematic - Ion Sputter Gun Model IG35-DP.

For seamless integration, 3D step files are available for all models.

Key Specifications

IONEC - MODEL IG35-DP
Ion source Electron impact ionization in magnetic field
Ionization Cathode Tungsten-rhenium filament directly mounted on 70mm OD CF flange
Beam current 0.5 μA at 0.25 keV
2.0 μA at 0.5 keV
3.5 μA at 1.0 keV
4.5 μA at 2.0 keV
7.0 μA at 3.0 keV
Operating Ar Pressure5.0 x 10-6 torr - Typical
Beam Energy 0 – 3.0 keV
Beam size From 5 to 10mm in diameter
Beam uniformity < 5%
Gas input Direct gas input to ion source via leak valve
Mounting 2.75" (70mm) OD CF flange
Bakeability Under vacuum - 250 °C max

Configuration Guide

The IG35 ion gun is controlled using the IPS3-D power supply.

For specifications, configuration, ordering guide, and more information, please download the IONEC Model IG35-DP Brochure in (PDF)

Brochure