OCI Vacuum Microengineering

Model IG35 IONEC

The IONEC will meet your requirements for high performance sputter ion gun while maintaining simplicity in its design and an unprecedented economy in its use of vacuum chamber space.
The IONEC, a miniature ion sputtering gun, is an instrument designed for cleaning sample surfaces and depth profiling for Auger Electron Spectroscopy. The gun produces a uniform, high density, inert gas ion beam with a beam diameter from 5 to 10 mm. The IONEC IG35 combines an enhanced ion source with an electrostatic lens configuration for accelerating and focusing the ion beam. The entire device is mounted on a mini CF flange. The gun has a port to admit gas directly into the ionization region and a port to differentially pump the lens region. This will maximize the pressure differential between the main chamber an the ion source. Features:
  • enhanced ion source for increased beam intensity
  • mini CF flange mounting
  • direct gas inlet to ion source
  • port for differential pumping
  • direct filament mounting on the mini CF flange feedthrough
  • variable beam energy from 0 to 3 keV, digital panel meters, remote control of beam energy and computer programming
Specifications Test Results
Ion Gun (Model IG35)

ION

Beam Energy

Ion Current

Chamber

Gas Pressure

Ion Current

Chamber

Gas Pressure

Ion Source Electron impact ionization in magnetic field

keV

m A

Torr

m A

Torr

Ionization Cathode Tungsten - Rhenium filament mounted directly on mini CF flange

Ar+

0.1

0.15

5x10-6

0.12

2.5x10-6

Beam Size Adjusted by focus voltage to 5 - 10 mm

0.2

0.6

0.5

Beam Current 16.5 µA at 3 keV energy and 2.5x10-5 Torr of Ar+

0.5

2.5

1.5

Beam Energy Variable from 0 to 3000 eV

1.0

7.5

3.5

Mounting 1.33" (35mm) O.D. CF flange

1.5

10.0

5.5

Bakeability Up to 220°C

2.0

13.0

8.5

Overall Sizes 12.7mm lens diameter, 153mm distance between mounting flange and filament feedthrough (220mm including), 100mm width and 40mm depth

2.5

-

13.5

 

3.0

-

16.5

Power Supply (model IPS2 and IPS3) Ordering Guide
Outputs Filament current: 1.5 - 4 A
Grid voltage: +185 V
Beam voltage: 0 - 3 kV
Focus voltage: x 0.3 - 0.8 of beam voltage
IG35 Complete ion sputter gun with port for differential pumping
Monitoring Beam Energy, Filament Current and Emission Current by digital panel meters (3 1/2 digit) IPS2 Power supply with voltage range 0 – 2000V
Controls 10 turn potentiometers for Beam Energy and Filament Current, 12 position switch for Focus IPS3 Power supply with voltage range 0 – 3000V
Remote Control
(optional)
Remote control mini-box for beam voltage RC Remote control mini-box
Computer control 0 to 9 V (Model IPS2)
0 to 5.4 V (Model IPS3)
F007 Replacement filament
Protection Short circuit and arc protection, self restoring F007-FL Replacement filament on mini CFF 4-pin feedthrough
Input 115 VAC, 60 Hz - standard
International range: 100/120/220/230/240 VAC, 47 - 440 Hz
Outline Drawing
Size 19" Rack mount  

OCI Vacuum Microengineering