OCI Vacuum Microengineering
mini-LEED

 

Low Energy Electron Diffraction / Auger Electron Spectroscopy

Model BDL450
with Integral Shutter

Miniature Back-Display LEED-AES Spectrometer Featuring Easy Fitting To Complex UHV Systems

 

 
  • Large Angle (90°) Fluorescent LEED Display
  • Mounting Flange: 4.5” O.D. (Cf63)
  • Auger Electron Spectroscopy as a Secondary Technique
  • Suitable For “ In Situ” Film Growth Monitoring
  • Integral Shutter
  • External Linear Retraction
  • Convenient LEED Image Capture with External CCD Camera
  • Simple And Powerful Operation with Digital Controller

Specifications Ordering Guide

LEED-AUGER OPTICS (Model BDL450)

BDL450-CP

Complete LEED-Auger package with 4.5” flange( incl. LMX, ISH, V450, LPS300, LOA10-AES, LIM08)

BDL450

LEED optics with integral electron gun on 4.5” flange (Specify 2 or 3 grid)

LMX-EXT External linear motion( nipple-below) (X=retraction distance)
ISH Integral shutter
V450 4.5”( CF63) viewport
LPS075 Power supply with voltage range 0 - 750V
LPS300 Power supply with voltage range 0 - 3kV
AES-Ser

AES software for external Lock-in Ampl.

LIM08 LEED imaging software with CCD camera, full version
LIM08B

LEED imaging software with CCD camera, basic version

LOA10-AES Digital AES controller with ramp voltage, sinewave oscillator, lock-in and AES software
RVO Ramp Voltage and sineware oscillator 
LOA100 External Lock-in Amplifier
Glass-Display

Fused silica glass coated with indium-tin oxide conductive layer and P31 phosphor ( ZnS:Ag:Cu-green, 525 nm wavelength)

  BDL450 ..... 90° angle of acceptance from sample at a distance
Retarding Field Analyzer

Concentric assembly of hemispherical grids

  BDL450 ..... Working distance from sample 10 mm
  Grid Material .....

Gold coated tungsten wire mesh (100 mesh, 81% transparency)

  Energy Resolution ..... 0.8% at low modulation voltage
Monitoring

4.5” (CF63) standard viewport

Linear Motion

External nipple with bellow up to 150 mm retraction

Integral Shutter

Open and close at any position of the linear motion

Magnetic Shielding Mu-metal cylinder with front cover for maximum
Assembly

Extreme-high-vacuum compatibility with stainless steel, high alumina and Au-plated copper alloy materials

Mounting

4.5” (CF63) double sided conflat flange with sample distance 145 mm - 580 mm

Bakeability Under vacuum, 250° C maximum
Integral Miniature Electron Gun
Beam Energy

LEED - 5 eV to 750 eV

AES to 3000 eV

Beam Current

LEED - 2 µA at 100 eV and 0.5 mm beam size

AES - up to 100 µA at 3 keV
Beam Size from 1 mm to 250 µm - adjusted by Wehnelt voltage
Electron Source Tungsten-2%Thoriated filament standard
Energy Spread 0.45 eV (thoriated tungsten filament)
Overall Size 10 mm lens diameter and 80 mm length


download BDL450 schematics in .pdf format